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Principal/MTS Chemistry Development Engineer, 3D DRAM Wet Etch

Date Posted: Jul 01, 2026
Yearly: USD - USD
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Job Detail

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    Location Amboise, Idaho, United States of America
  • desktop_windows
    Job Type: Permanent
  • schedule
    Shift:
  • analytics
    Career Level:
  • group
    Positions:
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    Experience:
  • male
    Gender: No Preference
  • school
    Degree:
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    Apply Before: Sep 29, 2026
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Job Description

Overview

Micron is seeking a Principal/MTS Chemistry Development Engineer to join their 3D DRAM Technology Development team in Boise, Idaho. This role focuses on innovating new chemistry for selective wet etching and involves collaboration with various process areas to achieve program and yield goals.

Key responsibilities

  • Drive strategic technical and tactical decisions at a project and platform level.
  • Engage with technical challenges proactively.
  • Develop and incorporate new liquid-based chemicals for wet etching.
  • Lead the transition of Micron IP into successful technical readiness.
  • Consult and influence technical and strategic decisions with senior management.

Required skills

  • 10+ years of experience in Physics, Chemistry, Chemical Engineering, or Material Science.
  • Experience in developing specialty chemicals in the semiconductor industry.
  • Expert-level knowledge in thermodynamics, kinetic factors, and fluid dynamics.
  • Ability to work independently and manage projects effectively.
  • Incorporation of AI, automation, or data science in daily work.

What the company offers

  • Choice of medical, dental, and vision plans.
  • Programs to protect income during illness or injury.
  • Paid family leave and a robust paid time-off program.
  • Paid holidays.

Skills Required

Company Overview

Micron
Idaho, United States of America
325 Current Jobs Openings

Micron Technology is a world leader in innovating memory and storage solutions that accelerate the transformation of information into intelligence. Micron is dedicated to personal wellbeing and professional growth. Read More

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